A pilot line will begin at Rapidus’ IIM-1 in April 2025. A single-wafer process will be introduced for all manufacturing ...

Rapidus plans to install as many as 10 EUV lithography tools into its upcoming fabs in Japan, reports TrendForce, citing Nikkan Kogyo Shimbun. The tools will be used for mass production of chips on ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

1). Figure 1: Since the mid-1980s, the wavelength of light used in lithography systems has reduced by almost half from 365 nm to 193 nm. Extreme ultraviolet (EUV) lithography is the next step in ...

We are specialists in contamination control research. We develop instrumentation and strategies for applications with the most challenging requirements in the High Tech Industry, including EUV ...

Extreme Ultraviolet (EUV) lithography is a critical technology for manufacturing semiconductor chips smaller than 7 nanometers. For years, Dutch company ASML has maintained a global monopoly on ...

New approaches in the development of extreme ultraviolet (EUV) lithography are being pioneered by Chinese scientists, paving the way for the mass production of advanced semiconductor chips as ...

A breakthrough introduced by Lam in 2020, dry resist extends the resolution, productivity, and yield of Extreme Ultraviolet (EUV) lithography, a pivotal technology used in the production of ...