1). Figure 1: Since the mid-1980s, the wavelength of light used in lithography systems has reduced by almost half from 365 nm to 193 nm. Extreme ultraviolet (EUV) lithography is the next step in ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

Many conclude from this that China could soon be producing chips using highly complex extreme ultraviolet (EUV) lithography technology. This would be a huge success for the country, as so far only ...

We are specialists in contamination control research. We develop instrumentation and strategies for applications with the most challenging requirements in the High Tech Industry, including EUV ...

EUV lithography uses light with a wavelength of just 13.5 nanometres - nearly X-ray level - a reduction of almost 14 times ...

All of this contributed to an optimistic atmosphere at the symposium. A large fraction of the technical papers were oriented toward various aspects of high-NA EUV lithography. Several presenters ...

These are the most-read DIGITIMES Asia stories from the week of March 10 – March 15. China's EUV breakthrough: Huawei, SMIC reportedly advancing LDP lithography, eye 3Q25 trial, 2026 rollout ...

In EUV lithography, and especially high-numerical-aperture EUV, balancing tradeoffs between resolution, sensitivity and line-width roughness is becoming increasingly difficult. Lithography patterning ...

Samsung Electronics reportedly deployed its first high-NA Extreme Ultraviolet (EUV) lithography machine at its Hwaseong Campus in early March. The move represents a key step in Samsung's push for ...