Lithography ... Although NA EUV is enabling tighter resolution, the anamorphic imaging method used is now requiring the exposure of two masks to achieve the standard 26x33mm field size on wafer. The ...

the field of lithography has seen a dramatic reduction in both the half-pitch feature size and the wavelengths used, but at very different rates. Extreme-ultraviolet (EUV) lithography involves ...

Interestingly, DUV lithography at a wavelength of 193 nm has dominated the field much ... features with half-pitches of 32 nm and 22 nm? An obvious choice is a switch to EUV lithography operating ...