Used in photolithography. Aligns masks to existing structures on a wafer and exposes the photo-resist to transfer the mask design.

As an inexpensive photolithography solution the MJB3 has set industry standards specifically for processing of small substrates and pieces up to 100mm. Equipped with a reliable, high precision ...

Photolithography at a wavelength of 193 ... To be successful the alignment of the two mask exposures is critical, and as twice as many mask exposures are required, throughput is approximately ...