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Thanks to the production-compatible Graphical User Interface (GUI), the Vistec SB3050-2 can be easily integrated into automated production environments (CIM). Capable of exposing both masks (including ...

Nanostencil lithography (NSL) is a shadow-mask-based nanopatterning technique that allows for the direct deposition of materials through a stencil mask with nanoscale openings. It enables the ...

Previous photolithography technologies used transmissive masks protected by a pellicle. For EUV lithography, however, the masks must be reflective and cannot have a protective pellicle as this ...

One significant advancement in computational lithography is the development of a high-precision thick-mask model that utilizes a decomposition machine learning method. This model improves the ...

Stencil lithography, a highly versatile nanofabrication technique, allows for the precise creation of micro- and nano-scale patterns across diverse substrates. By transferring intricate designs ...

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