and a dental porcelain etching gel — against a 300 nm silicon dioxide layer. Etch speed varied widely, from rust remover’s 10 nm/min to glass etching cream’s blazing 240 nm/min — we wonder ...

In fact, the etching rate for the alternating silicon oxide and silicon nitride layers more than doubled, increasing from 310 nanometers per minute to 640 nanometers per minute. (A human hair is ...

Adding it during the process quadrupled the etch rate for silicon dioxide, but it only had marginal impact on the silicon nitride layer. They also looked at ammonium fluorosilicate, a chemical ...