Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography.

Extreme-ultraviolet (EUV ... with a resolution down to several tens of nanometres. An extension of this technology could be an alternative option for next-generation, sub-13.5-nm lithography.

Extreme Ultraviolet (EUV) lithography is a critical technology for manufacturing semiconductor chips smaller than 7 nanometers. For years, Dutch company ASML has maintained a global monopoly on ...

This advancement could pave the way for a new generation of 'beyond EUV' lithography systems that produce chips quicker and with less power. Of course, implementing BAT technologies into ...

New approaches in the development of extreme ultraviolet (EUV) lithography are being pioneered by Chinese scientists, paving the way for the mass production of advanced semiconductor chips as ...