Interestingly, DUV lithography at a wavelength of 193 nm ... 1 is a process factor determined by the exact details of the optical system. The figure of merit for the polarization quality of ...

In this system, the first optic acts as both an aperture and a corrector plate ... this work also presents a version of the 2 cm eyepiece doublet that compatible with mass production-friendly deep ...

As mentioned above, the mirrors in the projection optics only reflect 72% of the incident EUV radiation at best. A typical projection lens assembly for a lithography system will include six or ...

One of the deep ultraviolet (DUV) lithography machines operates at a wavelength of 193 nanometres (nm), with a resolution ...

The list of electronic special equipment includes deep ultraviolet (DUV) lithography equipment called "argon fluoride lithography machine," with core technical specifications of "300mm wafer ...

This avoids the need for an optical system ... this new lithography method, which will be essential for widespread industry ...