However, the process, known as reactive ion etching, isn't fully understood and could be improved. One recent development involves keeping the wafer –– the sheet of semiconductor material to be ...

This emerging approach is called cryo etching. Traditionally, cryo etching uses separate hydrogen and fluorine gases to make the holes. The researchers compared results from this process to a more ...

This emerging approach is called cryo etching. Traditionally, cryo etching uses separate hydrogen and fluorine gases to make the holes. The researchers compared results from this process to a more ...

However, the process, known as reactive ion etching, isn’t fully understood and could be improved. One recent development involves keeping the wafer –– the sheet of semiconductor material to be ...

Scientists in China have made a new system for fueling the tokamak device. The continuous cryogenic pellet injection system overcomes challenges related to cryogenic ice formation and many others.