the field of lithography has seen a dramatic reduction in both the half-pitch feature size and the wavelengths used, but at very different rates. Extreme-ultraviolet (EUV) lithography involves ...

Now high NA lithography can achieve nearly three times greater feature density, critical for IC device nodes of 2nm and smaller. Although NA EUV is enabling tighter resolution, the anamorphic imaging ...

New approaches in the development of extreme ultraviolet (EUV) lithography are being pioneered by Chinese scientists, paving the way for the mass production of advanced semiconductor chips as ...